Smee lithography

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In the realm of lithography technology, China has been making significant strides towards self-sufficiency in chip production. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEE , China aimed to produce its own 28nm chips by the end of and 20nm chips by early , without relying on US fabrication technology and equipment. China's progress was hindered when the US, Japan, and the Netherlands initiated restrictions on the sales of advanced wafer fab equipment to Chinese companies. These restrictions, targeting chipmaking gear, which is a weak link in China's semiconductor supply chain, can be seen as a strategic alignment with the US-led "Chip-4 Alliance," aiming to curb China's semiconductor industry. Nevertheless, these restrictions have had an unintended consequence.

Smee lithography

Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. This is a bit surprising as SMEE said in October that it would introduce a 28nm-capable lithography tool by the end of the year. It's the latest development in a tit-for-tat chip war pitting the United States against China: The latest export rules set by the U. Additional restrictions from the Netherlands, Japan, and Taiwan, which came into effect earlier this year, have further cut off Chinese companies from sophisticated tools. Meanwhile, the U. Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.

Feb 19,

Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U. As a result, China needs advanced domestic lithography tools to ensure that its chipmakers can produce chips on even fairly advanced process technologies, such as 14nm.

Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. This is a bit surprising as SMEE said in October that it would introduce a 28nm-capable lithography tool by the end of the year.

Smee lithography

The economic cold war rages on. In October, the US imposed restrictions on AI chips and semiconductor manufacturing equipment , but it did not fully address all concerns. The US is the leader in wafer fabrication equipment with a majority share in deposition, etch, process control, CMP, and ion implantation, but many US equipment makers, such as Applied Materials, Lam Research, and KLA, have complained that US restrictions would allow overseas competitors such as the Dutch ASM International and Japanese Tokyo Electron to gain market share and blunt the impact of the technology restrictions. Furthermore, mask-related and OPC software required to operate lithography tools is also engineered in the US. On Friday, news broke that the three countries agreed to certain restrictions on lithography equipment. The question remains, how far do these restrictions go, and what do they contain? Our understanding is that these restrictions are extremely limited and only regard ArFi tools. This agreement is still verbal in nature, but we believe the 3 countries have agree to move forward on this basis.

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Contact me with news and offers from other Future brands Receive email from us on behalf of our trusted partners or sponsors. Contact me with news and offers from other Future brands Receive email from us on behalf of our trusted partners or sponsors. Dec 14, Sep 14, Global cooperation and collaboration are necessary. Feb 20, Jan 19, Mar 13, The announcement did not come without oddities. US Edition. The most advanced lithography machines, such as EUV machines, have hundreds of thousands of components, making reliance on the global supply chain essential. It's the latest development in a tit-for-tat chip war pitting the United States against China: The latest export rules set by the U. Jun 5,

At more advanced nodes below 28 nanometers, leading Chinese firms continue to have access to some advanced Western tools, particularly deep ultraviolet DUV immersion lithography systems, that they will continue to use for as long as possible to stretch logic production at more advanced nodes, particularly down to 7 and even 5 nanometers.

But processors didn't advanced much in 20 years. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEE , China aimed to produce its own 28nm chips by the end of and 20nm chips by early , without relying on US fabrication technology and equipment. Anton Shilov. It's the latest development in a tit-for-tat chip war pitting the United States against China: The latest export rules set by the U. It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. Even with Japan's recent export control measures for chipmaking equipment, including lithography machines, it is evident that China is likely one of the intended targets. US Edition. Full access to articles dating back to Stay on the Cutting Edge Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years. More about tech industry. While restrictions on chipmaking equipment have temporarily hindered China's progress, there are indications that the country is accelerating its efforts towards achieving chip self-sufficiency. Directory News Jobs Marketplace.